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Dark plasma regions reveal overlooked source of reactive atomic oxygen

Dark plasma regions reveal overlooked source of reactive atomic oxygen
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Scientists from Tokyo Metropolitan University have found a way to make plasma more effective for its wide-ranging uses, from antimicrobial applications to surface conditioning in the semiconductor industry. They mapped the production of atomic oxygen, a key ingredient of oxygen plasma, while a high voltage was applied across oxygen gas.

Scientists from Tokyo Metropolitan University have found a way to make plasma more effective for its wide-ranging uses, from antimicrobial applications to surface conditioning in the semiconductor industry. They mapped the production of atomic oxygen, a key ingredient of oxygen plasma, while a high voltage was applied across oxygen gas.
Tokyo Metropolitan University (ORG)
Originally published by Phys.org Read original →