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In-situ Silicon Doped hBN by High-Temperature Molecular Beam Epitaxy Enables Single Photon Emission
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arXiv:2606.01727v1 Announce Type: new Abstract: Hexagonal boron nitride (hBN) has emerged as a leading host for optically active quantum defects. Yet introduction of specific impurity species other than carbon remains unexplored. Here, we demonstrate an in-situ silicon doping of hBN grown by high-temperature molecular beam epitaxy (HT-MBE).
arXiv:2606.01727v1 Announce Type: new
Abstract: Hexagonal boron nitride (hBN) has emerged as a leading host for optically active quantum defects. Yet introduction of specific impurity species other than carbon remains unexplored. Here, we demonstrate an in-situ silicon doping of hBN grown by high-temperature molecular beam epitaxy (HT-MBE). By systematically varying the growth temperature from 900 to 1390 {\deg}C under a constant silicon flux, we establish an optimal window for Si incorporation to host a diverse range of emitters from 430-750 nm at room temperature. By transferring silicon-doped hBN film on SiO$_2$ substrate, we verified that single photon emitter activity was sustained in the hBN, demonstrating compatibility with device integration. The plausible origins of the observed optical transitions were discussed, and several potential candidates were proposed. Our results demonstrate a step toward a comprehensive understanding of in-situ doping of hBN and its utilization for quantum photonic applications.