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Optimization of EUV output by experimentally validated radiation-hydrodynamic simulations across a broad laser parameter space
arXiv:2606.05948v1 Announce Type: new Abstract: Practical requirements such as improving wall-plug efficiency and reducing system footprint have become increasingly important with the introduction of extreme ultraviolet (EUV) lithography into high-volume semiconductor manufacturing. These demands motivate the development of solid-state mid-infrared lasers as alternatives to current CO2 lasers. Systematic exploration of laser-to-EUV conversion efficiency (EUV-CE) over a broad parameter space...
Reconstructing Synthetic SDO/AIA 193 A EUV Images from He I 10830 A Observations with Diffusion Model Translator
arXiv:2606.08652v1 Announce Type: cross Abstract: Routine full-disk EUV imaging has been available only since the modern era, such as SOHO and SDO. To extend EUV coronal context into earlier periods, we leverage the multi-decade availability of full-disk \HeI{} observations, whose absorption is modulated by coronal irradiance and magnetic topology and is widely used as a proxy for open-field regions. We present a diffusion-based conditional image translation framework, Coronal Hole-aware...
Resolving the Blueshift in Calculations of the EUV Spectrum of Multiply Charged Tin Ions
arXiv:2606.04868v1 Announce Type: new Abstract: We report ab initio relativistic calculations on the complex open shell Sn$^{12+}$ highly charged ion, a prototypical plasma ion relevant for extreme ultraviolet (EUV) nanolithography. Previous calculations of EUV emissivity in tin plasmas consistently generate a spectrum in which the region of peak emissivity is blueshifted relative to experiment. By optimising our numerical methods to take full advantage of modern, high-performance CPU...
40% boost in extreme ultraviolet conversion efficiency via simultaneous dual-beam 2-{\mu}m laser irradiation
Announce Type: new Abstract: Scaling extreme ultraviolet (EUV) source power for next-generation lithography demands higher conversion efficiency (CE) at reduced per-pulse energies. We demonstrated a 40% CE enhancement by simultaneous dual-beam irradiation of a planar Sn target with a 2090-nm, 20-ns Ho:YAG laser. Single-beam irradiation at 40 mJ yielded an EUV CE of 2.6%; splitting the same total energy equally into two beams of 20 mJ each - at identical peak intensity - raised the EUV CE to...
First observation of the $\gamma$-ray beam production by the backward Compton scattering of reflected synchrotron radiation in the extreme ultraviolet range
Announce Type: replace Abstract: Compton scattering of photons off high-energy electrons is a fundamental quantum mechanical process widely utilized to produce a $\gamma$-ray beam for scientific research. Instead of injecting laser light into a storage ring as a conventional way, we have developed an innovative method to achieve drastically higher energies approaching the ring energy by the backward Compton scattering of extreme ultraviolet (EUV) light. In this method, $92$ $\mathrm{eV}$...
MeerKAT reveals three electron acceleration sites in one solar flare
MeerKAT reveals three electron acceleration sites in one solar flare Sadie Harley Scientific Editor Robert Egan Associate Editor Solar flares are the most explosive energy-release events in the solar corona, leading to intense particle acceleration, plasma heating and bulk plasma motions on short timescales. Core questions during solar flares remain unresolved, including how and where particle acceleration occurs, and how energized electrons propagate through coronal magnetic structures....
CEO of Europe’s biggest tech company to EU: Don’t intervene when you don't have your own
The CEO of Europe’s most valuable tech company, ASML, has delivered a blunt reality check to European Union (EU) policymakers. Christophe Fouquet, the chief executive of Dutch chip equipment giant ASML, questioned the EU’s aggressive stance on technology independence, warning Brussels against interfering in global semiconductor supply chains when the continent lacks the infrastructure to back it up. “If you don’t have your own supply chain, then how do you intervene [in the supply chain]?”
Quantifying Side-Channel Leakage in Public Metrology Releases
Announce Type: new Abstract: Public scientific and metrology releases can leak the hidden settings that produced them. We formalize and quantify this risk as a profiled statistical side-channel audit: a release map exposes finite-band statistics of a power spectral density (PSD), a profiled observer trains labeled template spectra under an explicit budget, and a challenge release is drawn from one of two utility-equivalent recipes separated by a protected coordinate. Averaged PSD bins follow...